High-frequency InGaAs tri-gate MOSFETs with fmax of 400 GHz

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Abstract

Extremely scaled down tri-gate RF metal-oxide-semiconductor field-effect transistors (MOSFETs) utilising lateral nanowires as the channel, with gate length and nanowire width both of 20 nm are reported. These devices exhibit simultaneous extrapolated ft and fmax of 275 and 400 GHz at VDS = 0.5 V, which is the largest combined ft and fmax, as well as the largest fmax reported for all III-V MOSFETs.

Detaljer

Författare
Enheter & grupper
Forskningsområden

Ämnesklassifikation (UKÄ) – OBLIGATORISK

  • Elektroteknik och elektronik
Originalspråkengelska
Sidor (från-till)1869-1871
Antal sidor3
TidskriftElectronics Letters
Volym52
Utgivningsnummer22
StatusPublished - 2016 okt 27
Peer review utfördJa

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