A Photo Emission Electron Microscope (PEEM) images surfaces using photoelectrons generated by a light source with photon energies exceeding the work function threshold (in the Ultra Violet range) or high intense lower energy ultrafast laser sources. The photoelectrons are accelerated in a 10‐15kVolt electric field, magnified via electrostatic elements, and imaged with a resolution down to about 20nm. Recording images with several different cut‐off values and subsequent subtraction allows imaging in a specific electron kinetic energy interval. The resolution achievable is presently 100meV. The instrument has to be operated in Ultra High Vacuum, and to allow the placement of the instrument at various laser sources a compact vacuum chamber has been added. PEEM with energy resolution can be used to study a multitude of nanoscaled systems, such organic molecules, metals, semiconductors and even device structures revealing intricate information on surface chemistry, electronic properties, workfunction differences etc. Briefly the instrument gives access to all information derived from photoemission spectroscopy (XPS) in both the valence band and low core‐level region, but with lateral resolution down to 20nm. Thus the instrument can image with chemical, electronic and structural contrast, and in addition have extreme time resolution.
Equipment and resources
Focus Integrated Stage Energy Filtered PEEM with Ultra High Vacuum Chamber and damped optical table for vibration isolation. Instrument is portable and can be placed with relevant (laser) light source.
Management of the infrastructure
Infrastructure is managed by Anders Mikkelsen.
UKÄ subject classification
- Physical Sciences
Type of infrastructure