Ivan Maximov

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2023

New high-resolution SiO2-based positive-tone resist for electron beam lithography
Cattoni, A., Mailly, D. & Maximov, I., 2023 Sept 27.
Research output: Contribution to conference › Poster › peer-review
2019

Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
Löfstrand, A., Suyatin, D., Nilsson, N., Otsuka, I., Kvennefors, A., Ring, J., Borsali, R. & Maximov, I., 2019 Oct 16, (Unpublished).
Research output: Contribution to conference › Poster › peer-review
Displacement Talbot Lithography for Fabrication of Large Area Nanoimprint Stamps
Graczyk, M., Asif, M. & Maximov, I., 2019 Sept 23, (Unpublished).
Research output: Contribution to conference › Poster › peer-review
Novel Lift-off Process for DUV Displacement Talbot Lithography
Graczyk, M., Gomez, V., Huffman, M. & Maximov, I., 2019 Sept 23, (Unpublished).
Research output: Contribution to conference › Poster › peer-review

Research output