Area-selective Electron-beam induced deposition of Amorphous-BNx on graphene

Virgínia Boix, Claudia Struzzi, Tamires Gallo, Niclas Johansson, Giulio D'acunto, Zhihua Yong, Alexei Zakharov, Zheshen Li, Joachim Schnadt, Anders Mikkelsen, Jan Knudsen

Research output: Contribution to journalArticlepeer-review

Abstract

Thin, stable and inert dielectric spacers are essential for manufacturing electronic devices based on 2D materials. However, direct synthesis on top of 2D materials is difficult due to their inert nature. In this work, we studied how an electron beam induces fragmentation of borazine and enables spatially confined synthesis of amorphous-BNx on graphene at room temperature. Using a combination of X-ray Photoelectron Spectroscopy, Low Energy Electron Microscopy, and Scanning Tunneling Microscopy we studied the morphology of the heterostructure, its chemical composition, and finally its temperature evolution. We find that electron-beam induced deposition starts by the binding of heavily fragmentized borazine, including atomic boron, followed by the growth of a multilayer with a 1:0.7 B:N ratio. The final structure exhibits a thermal stability up to 1400 K and ~ 50 nm spatial control provided by the electron beam. Our studies provide surface science insight into the use of electron beams for synthesis and lateral control of stable and inert layers in 2D heterostructures.

Original languageEnglish
Pages (from-to)149806
JournalApplied Surface Science
Volume557
DOIs
Publication statusPublished - 2021 Aug 1

Subject classification (UKÄ)

  • Condensed Matter Physics

Keywords

  • Amorphous Boron Nitride
  • Electron-Beam Induced Deposition
  • Graphene
  • LEEM
  • STM
  • XPS

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