Abstract
III-V nanowires have been fabricated by metal-organic vapor-phase epitaxy without using Au or other metal particles as a catalyst. Instead, prior to growth, a thin SiOx layer is deposited on the substrates. Wires form on various III-V substrates as well as on Si. They are nontapered in thickness and exhibit a hexagonal cross-section. From high-resolution X-ray diffraction, the epitaxial relation between wires and substrates is demonstrated and their crystal structure is determined.
Original language | English |
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Pages (from-to) | 1817-1821 |
Journal | Nano Letters |
Volume | 6 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2006 |
Bibliographical note
The information about affiliations in this record was updated in December 2015.The record was previously connected to the following departments: Solid State Physics (011013006), Synchrotron Radiation Research (011013009), Polymer and Materials Chemistry (LTH) (011001041)
Subject classification (UKÄ)
- Nano-technology