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Comparison of aluminum nitride thin films prepared by magnetron sputter epitaxy in nitrogen and ammonia atmosphere
Balasubramanian Sundarapandian, Dat Q. Tran, Lutz Kirste, Patrik Straňák, Andreas Graff, Mario Prescher, Akash Nair, Mohit Raghuwanshi, Vanya Darakchieva, Plamen P. Paskov, Oliver Ambacher
Research output: Contribution to journal › Article › peer-review