Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

Muhammad Asif; Mariusz Graczyk; Babak Heidari; Ivan Maximov

doi:10.1016/j.mne.2022.100118

Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

Muhammad Asif, Mariusz Graczyk, Babak Heidari, Ivan Maximov

Research output: Contribution to journal › Article › peer-review

Abstract

We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.

Original language	English
Article number	100118
Number of pages	7
Journal	Micro and Nano Engineering
Volume	14
DOIs	https://doi.org/10.1016/j.mne.2022.100118
Publication status	Published - 2022 Feb 26

Subject classification (UKÄ)

Nano Technology
Other Physics Topics
Condensed Matter Physics

Free keywords

nanoimprint stamps
UV-curable polymers
nanoimprint lithography
high resolution patterning

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10.1016/j.mne.2022.100118Licence: CC BY

Cite this

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title = "Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps",

abstract = "We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young{\textquoteright}s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.",

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author = "Muhammad Asif and Mariusz Graczyk and Babak Heidari and Ivan Maximov",

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T1 - Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

AU - Asif, Muhammad

AU - Graczyk, Mariusz

AU - Heidari, Babak

AU - Maximov, Ivan

PY - 2022/2/26

Y1 - 2022/2/26

N2 - We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.

AB - We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.

KW - nanoimprint stamps

KW - UV-curable polymers

KW - nanoimprint lithography

KW - high resolution patterning

U2 - 10.1016/j.mne.2022.100118

DO - 10.1016/j.mne.2022.100118

M3 - Article

SN - 2590-0072

VL - 14

JO - Micro and Nano Engineering

JF - Micro and Nano Engineering

M1 - 100118

ER -

Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

Abstract

Subject classification (UKÄ)

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