Abstract
A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.
| Original language | English |
|---|---|
| Pages (from-to) | 2627-2629 |
| Journal | Applied Physics Letters |
| Volume | 68 |
| Issue number | 19 |
| DOIs | |
| Publication status | Published - 1996 |
Subject classification (UKÄ)
- Atom and Molecular Physics and Optics