Droplet-target laser-plasma source for proximity x-ray lithography

Lennart Malmqvist; L Rymell; H. M Hertz

doi:10.1063/1.116203

Droplet-target laser-plasma source for proximity x-ray lithography

Lennart Malmqvist, L Rymell, H. M Hertz

Atomic Physics

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Abstract

A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

Original language	English
Pages (from-to)	2627-2629
Journal	Applied Physics Letters
Volume	68
Issue number	19
DOIs	https://doi.org/10.1063/1.116203
Publication status	Published - 1996

Subject classification (UKÄ)

Atom and Molecular Physics and Optics

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10.1063/1.116203

Malmqvist1996

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title = "Droplet-target laser-plasma source for proximity x-ray lithography",

abstract = "A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5\% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.",

author = "Lennart Malmqvist and L Rymell and Hertz, \{H. M\}",

year = "1996",

doi = "10.1063/1.116203",

language = "English",

volume = "68",

pages = "2627--2629",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics (AIP)",

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T1 - Droplet-target laser-plasma source for proximity x-ray lithography

AU - Malmqvist, Lennart

AU - Rymell, L

AU - Hertz, H. M

PY - 1996

Y1 - 1996

N2 - A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

AB - A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

UR - https://www.scopus.com/pages/publications/0030572086

U2 - 10.1063/1.116203

DO - 10.1063/1.116203

M3 - Article

SN - 0003-6951

VL - 68

SP - 2627

EP - 2629

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

ER -

Droplet-target laser-plasma source for proximity x-ray lithography

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