Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

Matias Kagias; Zhentian Wang; Vitaliy A. Guzenko; Christian David; Marco Stampanoni; Konstantins Jefimovs

doi:10.1016/j.mssp.2018.04.015

Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

Matias Kagias, Zhentian Wang, Vitaliy A. Guzenko, Christian David, Marco Stampanoni, Konstantins Jefimovs

Research output: Contribution to journal › Review article › peer-review

Abstract

High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.

Original language	English
Pages (from-to)	73-79
Number of pages	7
Journal	Materials Science in Semiconductor Processing
Volume	92
DOIs	https://doi.org/10.1016/j.mssp.2018.04.015
Publication status	Published - 2019 Mar 15
Externally published	Yes

Subject classification (UKÄ)

Atom and Molecular Physics and Optics

Free keywords

Deep reactive ion etching
Electroplating
Grating fabrication
X-ray interferometry

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10.1016/j.mssp.2018.04.015

Cite this

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title = "Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry",

abstract = "High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.",

keywords = "Deep reactive ion etching, Electroplating, Grating fabrication, X-ray interferometry",

author = "Matias Kagias and Zhentian Wang and Guzenko, \{Vitaliy A.\} and Christian David and Marco Stampanoni and Konstantins Jefimovs",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier Ltd",

year = "2019",

month = mar,

day = "15",

doi = "10.1016/j.mssp.2018.04.015",

language = "English",

volume = "92",

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journal = "Materials Science in Semiconductor Processing",

issn = "1369-8001",

publisher = "Elsevier",

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TY - JOUR

T1 - Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

AU - Kagias, Matias

AU - Wang, Zhentian

AU - Guzenko, Vitaliy A.

AU - David, Christian

AU - Stampanoni, Marco

AU - Jefimovs, Konstantins

PY - 2019/3/15

Y1 - 2019/3/15

N2 - High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.

AB - High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.

KW - Deep reactive ion etching

KW - Electroplating

KW - Grating fabrication

KW - X-ray interferometry

UR - https://www.scopus.com/pages/publications/85046140154

U2 - 10.1016/j.mssp.2018.04.015

DO - 10.1016/j.mssp.2018.04.015

M3 - Review article

AN - SCOPUS:85046140154

SN - 1369-8001

VL - 92

SP - 73

EP - 79

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

ER -

Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

Abstract

Subject classification (UKÄ)

Free keywords

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