TY - JOUR
T1 - Fully tunable, non-invasive thermal biasing of gated nanostructures suitable for low-temperature studies.
AU - Gluschke, Jan-Göran
AU - Fahlvik Svensson, Sofia
AU - Thelander, Claes
AU - Linke, Heiner
PY - 2014
Y1 - 2014
N2 - There is much recent interest in the thermoelectric (TE) characterization of single nanostructures at low temperatures, because such measurements yield information that is complementary to traditional conductance measurements, and because they may lead to novel paradigms for TE energy conversion. However, previously reported techniques for thermal biasing of nanostructures are difficult to use at low temperatures because of unintended global device heating, the lack of ability to continuously tune the thermal bias, or limited compatibility with gating techniques. By placing a heater directly on top of the electrical contact to a single InAs nanowire, we demonstrate fully tunable thermal biases of up to several tens of Kelvin, combined with negligible overall heating of the device, and with full functionality of a back gate, in the temperature range between 4 K and 300 K.
AB - There is much recent interest in the thermoelectric (TE) characterization of single nanostructures at low temperatures, because such measurements yield information that is complementary to traditional conductance measurements, and because they may lead to novel paradigms for TE energy conversion. However, previously reported techniques for thermal biasing of nanostructures are difficult to use at low temperatures because of unintended global device heating, the lack of ability to continuously tune the thermal bias, or limited compatibility with gating techniques. By placing a heater directly on top of the electrical contact to a single InAs nanowire, we demonstrate fully tunable thermal biases of up to several tens of Kelvin, combined with negligible overall heating of the device, and with full functionality of a back gate, in the temperature range between 4 K and 300 K.
U2 - 10.1088/0957-4484/25/38/385704
DO - 10.1088/0957-4484/25/38/385704
M3 - Article
C2 - 25181529
SN - 0957-4484
VL - 25
JO - Nanotechnology
JF - Nanotechnology
IS - 38
M1 - 385704
ER -