Growth and reactivity of titanium oxide ultrathin films on Ni(110)

Anthoula Chrysa Papageorgiou; Gregory Cabailh; Qiao Chen; Andrea Resta; Edvin Lundgren; Jesper N Andersen; Geoff Thornton

doi:10.1021/jp067802m

Growth and reactivity of titanium oxide ultrathin films on Ni(110)

Anthoula Chrysa Papageorgiou, Gregory Cabailh, Qiao Chen, Andrea Resta, Edvin Lundgren, Jesper N Andersen, Geoff Thornton

Synchrotron Radiation Research

Research output: Contribution to journal › Article › peer-review

Abstract

Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.

Original language	English
Pages (from-to)	7704-7710
Journal	Journal of Physical Chemistry C
Volume	111
Issue number	21
DOIs	https://doi.org/10.1021/jp067802m
Publication status	Published - 2007

Subject classification (UKÄ)

Atom and Molecular Physics and Optics

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10.1021/jp067802m

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title = "Growth and reactivity of titanium oxide ultrathin films on Ni(110)",

abstract = "Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.",

author = "Papageorgiou, {Anthoula Chrysa} and Gregory Cabailh and Qiao Chen and Andrea Resta and Edvin Lundgren and Andersen, {Jesper N} and Geoff Thornton",

year = "2007",

doi = "10.1021/jp067802m",

language = "English",

volume = "111",

pages = "7704--7710",

journal = "Journal of Physical Chemistry C",

issn = "1932-7447",

publisher = "The American Chemical Society (ACS)",

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TY - JOUR

T1 - Growth and reactivity of titanium oxide ultrathin films on Ni(110)

AU - Papageorgiou, Anthoula Chrysa

AU - Cabailh, Gregory

AU - Chen, Qiao

AU - Resta, Andrea

AU - Lundgren, Edvin

AU - Andersen, Jesper N

AU - Thornton, Geoff

PY - 2007

Y1 - 2007

N2 - Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.

AB - Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.

U2 - 10.1021/jp067802m

DO - 10.1021/jp067802m

M3 - Article

SN - 1932-7447

VL - 111

SP - 7704

EP - 7710

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 21

ER -

Growth and reactivity of titanium oxide ultrathin films on Ni(110)

Abstract

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