High rate direct current reactive sputter deposition of Al2O3 - Required process parameters

Karol Macak, Maryam Olsson, Ulf Helmersson

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

Original language	English
Title of host publication	CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997
Publisher	Société française du vide
Pages	176
Publication status	Published - 1997
Externally published	Yes
Event	11th International colloquium on plasma processes - Le Mans, France Duration: 1997 May 25 → 1997 May 29

Conference	11th International colloquium on plasma processes
Country/Territory	France
City	Le Mans
Period	1997/05/25 → 1997/05/29

Subject classification (UKÄ)

@inproceedings{12e7d268680c4854a83d5552874e6428,

title = "High rate direct current reactive sputter deposition of Al2O3 - Required process parameters",

author = "Karol Macak and Maryam Olsson and Ulf Helmersson",

year = "1997",

language = "English",

pages = "176",

booktitle = "CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997",

publisher = "Soci{\'e}t{\'e} fran{\c c}aise du vide",

note = "11th International colloquium on plasma processes ; Conference date: 25-05-1997 Through 29-05-1997",

}

High rate direct current reactive sputter deposition of Al2O3 - Required process parameters. / Macak, Karol; Olsson, Maryam; Helmersson, Ulf.
CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997. Société française du vide, 1997. p. 176.

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

TY - GEN

T1 - High rate direct current reactive sputter deposition of Al2O3 - Required process parameters

AU - Macak, Karol

AU - Olsson, Maryam

AU - Helmersson, Ulf

PY - 1997

Y1 - 1997

M3 - Paper in conference proceeding

SP - 176

BT - CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997

PB - Société française du vide

T2 - 11th International colloquium on plasma processes

Y2 - 25 May 1997 through 29 May 1997

ER -