Investigation of PMMA resist residues using photoelectron microscopy

Ivan Maximov, Alexei Zakharov, T. Holmqvist, Lars Montelius, Ingolf Lindau

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1139-1142
Journal	Journal of Vacuum Science and Technology
Volume	B20
Issue number	3
Publication status	Published - 2002

Subject classification (UKÄ)

@article{084044292adb489fb2812549e35fb8cc,

title = "Investigation of PMMA resist residues using photoelectron microscopy",

author = "Ivan Maximov and Alexei Zakharov and T. Holmqvist and Lars Montelius and Ingolf Lindau",

year = "2002",

language = "English",

volume = "B20",

pages = "1139--1142",

journal = "Journal of Vacuum Science and Technology",

number = "3",

}