Low-Frequency Noise in Vertical InAs/InGaAs Gate-All-Around MOSFETs at 15 K for Cryogenic Applications

Saketh, Ram Mamidala, Johannes Svensson, Sebastian Skog, Sofie Johannesson, Lars-Erik Wernersson

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Abstract

Low-frequency noise (LFN), or 1/ f -noise, can be used effectively to evaluate device reliability which is a major concern in analog as well as digital circuits. In this work, we present 1/ f -noise characterization of vertical InAs/InGaAs gate-all-around (GAA) MOSFETs with a 70-nm gate length ( LG ) measured at cryogenic temperatures down to 15 K. The measurements at cryogenic temperatures reveal that the physical mechanism of 1/ f -noise changes from carrier number fluctuations at 300 K to mobility fluctuations at 15 K. We conclude that the channel conduction at 15 K is dominated by the nanowire core instead of the nanowire surface due to the effect of the border and interface traps freezing out. Vertical InAs/InGaAs GAA MOSFETs at 15 K, due to reduced surface scattering, exhibit a low value of Hooge parameter, αH ~ 5×10-6 and also have a low input-referred gate voltage noise spectral density, SVG=4.3μV2μm2 Hz -1 that are important for reliable cryogenic circuit applications.
Original languageEnglish
Pages (from-to)2033
Number of pages2036
JournalIEEE Electron Device Letters
Volume43
Issue number12
DOIs
Publication statusPublished - 2022 Oct 19

Subject classification (UKÄ)

  • Condensed Matter Physics

Free keywords

  • MOSFET
  • Noise measurement
  • Fluctuations
  • Temperature
  • Cryogenics
  • Indium gallium arsenide
  • Logic gates

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