Moiré method for nanometer instability investigation of scanning hard x-ray microscopes

Ulrich Vogt, Daniel Köhler, Jannis Dickmann, Jussi Rahomäki, Karolis Parfeniukas, Stefan Kubsky, Filipe Alves, Florent Langlois, Christer Engblom, Tomas Stankevic

Research output: Contribution to journalArticlepeer-review

Abstract

We present a Moiré method that can be used to investigate positional instabilities in a scanning hard x-ray microscope with nanometer precision. The development of diffractionlimited storage rings offering highly-brilliant synchrotron radiation and improvements of nanofocusing x-ray optics paves the way towards 3D nanotomography with 10 nm resolution or below. However, this trend demands improved designs of x-ray microscope instruments which should offer few-nm beam stabilities with respect to the sample. Our technique can measure the position of optics and sample stage relative to each other in the two directions perpendicular to the beam propagation in a scanning x-ray microscope using simple optical components and visible light. The usefulness of the method was proven by measuring short and long term instabilities of a zone-plate-optics-based prototype microscope. We think it can become an important tool for the characterization of scanning x-ray microscopes, especially prior to experiments with an actual x-ray beam.

Original languageEnglish
Pages (from-to)12188-12194
Number of pages7
JournalOptics Express
Volume25
Issue number11
DOIs
Publication statusPublished - 2017 May 29

Subject classification (UKÄ)

  • Atom and Molecular Physics and Optics

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