Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture

Daniel Forchheimer, Gang Luo, Lei Ye, Lars Montelius

Research output: Chapter in Book/Report/Conference proceedingPaper in conference proceedingpeer-review

Abstract

Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3527080]
Original languageEnglish
Title of host publicationJournal of Vacuum Science & Technology B
PublisherAmerican Vacuum Society
Volume29
DOIs
Publication statusPublished - 2011
Event54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Anchorage, AK
Duration: 2010 Jun 12010 Jun 4

Publication series

Name
Number1
Volume29
ISSN (Print)1071-1023
ISSN (Electronic)1520-8567

Conference

Conference54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Period2010/06/012010/06/04

Subject classification (UKÄ)

  • Biochemistry and Molecular Biology
  • Condensed Matter Physics

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