Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

Gang Luo, Ivan Maximov, Sara Ghatnekar-Nilsson, David Adolph, Mariusz Graczyk, Patrick Carlberg, Dan Hessman, T Zhu, Z F Liu, Hongqi Xu, Lars Montelius

Research output: Chapter in Book/Report/Conference proceedingPaper in conference proceedingpeer-review

Original languageEnglish
Title of host publicationBook of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
Publication statusPublished - 2006
Event14th Intl Symp “Nanostructures: Physics and Technology”, 2006 - St Petersburg, Russian Federation
Duration: 2006 Jun 252006 Jun 30
Conference number: 14


Conference14th Intl Symp “Nanostructures: Physics and Technology”, 2006
Country/TerritoryRussian Federation
CitySt Petersburg

Subject classification (UKÄ)

  • Condensed Matter Physics

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