Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

Gang Luo; Ivan Maximov; Sara Ghatnekar-Nilsson; David Adolph; Mariusz Graczyk; Patrick Carlberg; Dan Hessman; T Zhu; Z F Liu; Hongqi Xu; Lars Montelius

Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

Gang Luo, Ivan Maximov, Sara Ghatnekar-Nilsson, David Adolph, Mariusz Graczyk, Patrick Carlberg, Dan Hessman, T Zhu, Z F Liu, Hongqi Xu, Lars Montelius

Solid State Physics

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

Original language	English
Title of host publication	Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
Publication status	Published - 2006
Event	14th Intl Symp “Nanostructures: Physics and Technology”, 2006 - St Petersburg, Russian Federation Duration: 2006 Jun 25 → 2006 Jun 30 Conference number: 14

Conference

Conference	14th Intl Symp “Nanostructures: Physics and Technology”, 2006
Country/Territory	Russian Federation
City	St Petersburg
Period	2006/06/25 → 2006/06/30

Subject classification (UKÄ)

Condensed Matter Physics (including Material Physics, Nano Physics)

Cite this

@inproceedings{982781bc6d674298a556e3ba803be84c,

title = "Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures",

author = "Gang Luo and Ivan Maximov and Sara Ghatnekar-Nilsson and David Adolph and Mariusz Graczyk and Patrick Carlberg and Dan Hessman and T Zhu and Liu, \{Z F\} and Hongqi Xu and Lars Montelius",

year = "2006",

language = "English",

booktitle = "Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)",

note = "14th Intl Symp “Nanostructures: Physics and Technology”, 2006 ; Conference date: 25-06-2006 Through 30-06-2006",

}

Luo, G, Maximov, I, Ghatnekar-Nilsson, S, Adolph, D, Graczyk, M, Carlberg, P, Hessman, D, Zhu, T, Liu, ZF, Xu, H & Montelius, L 2006, Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures. in Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006). 14th Intl Symp “Nanostructures: Physics and Technology”, 2006, St Petersburg, Russian Federation, 2006/06/25.

Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures. / Luo, Gang; Maximov, Ivan; Ghatnekar-Nilsson, Sara et al.
Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006). 2006.

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

TY - GEN

T1 - Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

AU - Luo, Gang

AU - Maximov, Ivan

AU - Ghatnekar-Nilsson, Sara

AU - Adolph, David

AU - Graczyk, Mariusz

AU - Carlberg, Patrick

AU - Hessman, Dan

AU - Zhu, T

AU - Liu, Z F

AU - Xu, Hongqi

AU - Montelius, Lars

N1 - Conference code: 14

PY - 2006

Y1 - 2006

M3 - Paper in conference proceeding

BT - Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)

T2 - 14th Intl Symp “Nanostructures: Physics and Technology”, 2006

Y2 - 25 June 2006 through 30 June 2006

ER -