Nanoimprinted passive optical devices

J Seekamp, S Zankovych, AH Helfer, P Maury, CMS Torres, G Bottger, C Liguda, M Eich, B Heidari, Lars Montelius, J Ahopelto

Research output: Contribution to journalArticlepeer-review

57 Citations (SciVal)


We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm(-1) at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.
Original languageEnglish
Pages (from-to)581-586
Issue number5
Publication statusPublished - 2002

Subject classification (UKÄ)

  • Nano Technology


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