Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source

L Malmqvist, A. L Bogdanov, Lars Montelius, H. M Hertz

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Abstract

A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers resulting in projected exposure times of similar to 10 s. (C) 1997 American Vacuum Society.
Original languageEnglish
Pages (from-to)814-817
JournalJournal of Vacuum Science and Technology B
Volume15
Issue number4
DOIs
Publication statusPublished - 1997

Bibliographical note

The information about affiliations in this record was updated in December 2015.
The record was previously connected to the following departments: Atomic physics (011013005), Physics, Faculty of Technology (011013200)

Subject classification (UKÄ)

  • Atom and Molecular Physics and Optics

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