Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

Lars Henrik Skjolding, Genis Turon Teixidor, Jenny Emnéus, Lars Montelius

Research output: Chapter in Book/Report/Conference proceedingPaper in conference proceedingpeer-review

13 Citations (SciVal)

Abstract

This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
Original languageEnglish
Title of host publicationMicroelectronic Engineering
PublisherElsevier
Pages654-656
Volume86
DOIs
Publication statusPublished - 2009
Event34th International Conference on Micro- and Nano-Engineering - Athens, Greece
Duration: 2008 Sep 152008 Sep 18

Publication series

Name
Number4-6
Volume86
ISSN (Print)1873-5568
ISSN (Electronic)0167-9317

Conference

Conference34th International Conference on Micro- and Nano-Engineering
Country/TerritoryGreece
CityAthens
Period2008/09/152008/09/18

Bibliographical note

The information about affiliations in this record was updated in December 2015.
The record was previously connected to the following departments: Solid State Physics (011013006), Analytical Chemistry (S/LTH) (011001004)

Subject classification (UKÄ)

  • Condensed Matter Physics

Keywords

  • Interdigitated electrodes
  • Alignment strategy
  • Mix-and-match lithography
  • UV lithography
  • NIL
  • SU-8 2005

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