Nitrogen-Doped Graphene: Efficient Growth, Structure, and Electronic Properties

D. Usachov, O. Vilkov, A. Grueneis, D. Haberer, A. Fedorov, V. K. Adamchuk, Alexei Preobrajenski, P. Dudin, A. Barinov, M. Oehzelt, C. Laubschat, D. V. Vyalikh

Research output: Contribution to journalArticlepeer-review

Abstract

A novel strategy for efficient growth of nitrogen-doped graphene (N-graphene) on a large scale from s-triazine molecules is presented. The growth process has been unveiled in situ using time-dependent photoemission. It has been established that a postannealing of N-graphene after gold intercalation causes a conversion of the N environment from pyridinic to graphitic, allowing to obtain more than 8096 of all embedded nitrogen in graphitic form, which is essential for the electron doping in graphene. A band gap, a doping level of 300 meV, and a charge-carrier concentration of similar to 8 x 10(12) electrons per cm 2, induced by 0.4 atom % of graphitic nitrogen, have been detected by angle-resolved photoeinission spectroscopy, which offers great promise for implementation of this system in next generation electronic devices.
Original languageEnglish
Pages (from-to)5401-5407
JournalNano Letters
Volume11
Issue number12
DOIs
Publication statusPublished - 2011

Subject classification (UKÄ)

  • Nano-technology

Free keywords

  • Graphene
  • nitrogen doping
  • electronic structure
  • synthesis
  • triazine
  • ARPES

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