Abstract
A novel strategy for efficient growth of nitrogen-doped graphene (N-graphene) on a large scale from s-triazine molecules is presented. The growth process has been unveiled in situ using time-dependent photoemission. It has been established that a postannealing of N-graphene after gold intercalation causes a conversion of the N environment from pyridinic to graphitic, allowing to obtain more than 8096 of all embedded nitrogen in graphitic form, which is essential for the electron doping in graphene. A band gap, a doping level of 300 meV, and a charge-carrier concentration of similar to 8 x 10(12) electrons per cm 2, induced by 0.4 atom % of graphitic nitrogen, have been detected by angle-resolved photoeinission spectroscopy, which offers great promise for implementation of this system in next generation electronic devices.
Original language | English |
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Pages (from-to) | 5401-5407 |
Journal | Nano Letters |
Volume | 11 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2011 |
Subject classification (UKÄ)
- Nano-technology
Free keywords
- Graphene
- nitrogen doping
- electronic structure
- synthesis
- triazine
- ARPES