Abstract
Nitrogen-polar III-nitride heterostructures offer advantages over
metal-polar structures in high frequency and high power applications.
However, polarity control in III-nitrides is difficult to achieve as a
result of unintentional polarity inversion domains (IDs). Herein, we
present a comprehensive structural investigation with both atomic detail
and thermodynamic analysis of the polarity evolution in low- and
high-temperature AlN layers on on-axis and 4° off-axis carbon-face
4H-SiC (0001̅) grown by hot-wall metal organic chemical vapor
deposition. A polarity control strategy has been developed by variation
of thermodynamic Al supersaturation and substrate misorientation angle
in order to achieve the desired growth mode and polarity. We demonstrate
that IDs are completely suppressed for high-temperature AlN nucleation
layers when a step-flow growth mode is achieved on the off-axis
substrates. We employ this approach to demonstrate high quality N-polar
epitaxial AlGaN/GaN/AlN heterostructures.
Original language | English |
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Pages (from-to) | 1049 –1056 |
Number of pages | 8 |
Journal | Crystal Growth and Design |
Volume | 23 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2023 Jan |
Subject classification (UKÄ)
- Materials Engineering
Free keywords
- N-polar GaN
- polarity
- TEM
- MOCVD