Polarization dependence of light intensity distribution near a nanometric aluminum slit

CH Wei, PH Tsao, W Farm, PK Wei, Jonas Tegenfeldt, RH Austin

Research output: Contribution to journalArticlepeer-review

Abstract

The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes. (C) 2004 Optical Society of America.
Original languageEnglish
Pages (from-to)1005-1012
JournalOptical Society of America. Journal B: Optical Physics
Volume21
Issue number5
Publication statusPublished - 2004

Subject classification (UKÄ)

  • Condensed Matter Physics (including Material Physics, Nano Physics)

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