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Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication
Anette Löfstrand, Reza Jafari Jam, Karolina Mothander, Tommy Nylander, Muhammad Mumtaz, Alexei Vorobiev, Wen Chang Chen, Redouane Borsali, Ivan Maximov
Research output: Contribution to journal › Article › peer-review