Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

M Keil, Marc Beck, G Frennesson, Elke Theander, E Bolmsjö, Lars Montelius, B Heidari

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

Original language	English
Title of host publication	J Vac Sci Technol B 22, 3283-3287 (2004)
Publication status	Published - 2004
Event	48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004) - Duration: 0001 Jan 2 → …

Conference	48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
Period	0001/01/02 → …

Subject classification (UKÄ)

@inproceedings{c62d7683ff0b49fdb7f062152b613573,

title = "Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography",

author = "M Keil and Marc Beck and G Frennesson and Elke Theander and E Bolmsj{\"o} and Lars Montelius and B Heidari",

year = "2004",

language = "English",

booktitle = "J Vac Sci Technol B 22, 3283-3287 (2004)",

note = "48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004) ; Conference date: 02-01-0001",

}

Keil, M, Beck, M, Frennesson, G, Theander, E, Bolmsjö, E, Montelius, L & Heidari, B 2004, Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography. in J Vac Sci Technol B 22, 3283-3287 (2004). 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004), 0001/01/02.

TY - GEN

T1 - Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

AU - Keil, M

AU - Beck, Marc

AU - Frennesson, G

AU - Theander, Elke

AU - Bolmsjö, E

AU - Montelius, Lars

AU - Heidari, B

PY - 2004

Y1 - 2004

M3 - Paper in conference proceeding

BT - J Vac Sci Technol B 22, 3283-3287 (2004)

T2 - 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)

Y2 - 2 January 0001

ER -