Quantitative characterization of aberrations in x-ray optics

Frank Seiboth; Maik Kahnt; Maria Scholz; Martin Seyrich; Felix Wittwer; Jan Garrevoet; Gerald Falkenberg; Andreas Schropp; Christian G. Schroer

doi:10.1117/12.2237646

Quantitative characterization of aberrations in x-ray optics

Frank Seiboth, Maik Kahnt, Maria Scholz, Martin Seyrich, Felix Wittwer, Jan Garrevoet, Gerald Falkenberg, Andreas Schropp, Christian G. Schroer

Research output: Chapter in Book/Report/Conference proceeding › Paper in conference proceeding › peer-review

Abstract

Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

Original language	English
Title of host publication	Advances in X-Ray/EUV Optics and Components XI
Editors	Christian Morawe, Ali M. Khounsary, Shunji Goto
Publisher	SPIE
Volume	9963
ISBN (Electronic)	9781510603172
DOIs	https://doi.org/10.1117/12.2237646
Publication status	Published - 2016 Jan 1
Externally published	Yes
Event	Conferene on Advances in X-Ray/EUV Optics and Components XI - San Diego, United States Duration: 2016 Aug 31 → 2016 Sep 1

Conference

Conference	Conferene on Advances in X-Ray/EUV Optics and Components XI
Country/Territory	United States
City	San Diego
Period	2016/08/31 → 2016/09/01

Keywords

aberrations
Beam characterization
compound refractive X-ray lenses
hard X-ray nanobeam
ptychography
Zernike polynomials

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10.1117/12.2237646

Cite this

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title = "Quantitative characterization of aberrations in x-ray optics",

abstract = "Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.",

keywords = "aberrations, Beam characterization, compound refractive X-ray lenses, hard X-ray nanobeam, ptychography, Zernike polynomials",

author = "Frank Seiboth and Maik Kahnt and Maria Scholz and Martin Seyrich and Felix Wittwer and Jan Garrevoet and Gerald Falkenberg and Andreas Schropp and Schroer, {Christian G.}",

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doi = "10.1117/12.2237646",

language = "English",

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editor = "Christian Morawe and Khounsary, {Ali M.} and Shunji Goto",

booktitle = "Advances in X-Ray/EUV Optics and Components XI",

publisher = "SPIE",

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note = "Conferene on Advances in X-Ray/EUV Optics and Components XI ; Conference date: 31-08-2016 Through 01-09-2016",

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Seiboth, F, Kahnt, M, Scholz, M, Seyrich, M, Wittwer, F, Garrevoet, J, Falkenberg, G, Schropp, A & Schroer, CG 2016, Quantitative characterization of aberrations in x-ray optics. in C Morawe, AM Khounsary & S Goto (eds), Advances in X-Ray/EUV Optics and Components XI. vol. 9963, 99630P, SPIE, Conferene on Advances in X-Ray/EUV Optics and Components XI, San Diego, United States, 2016/08/31. https://doi.org/10.1117/12.2237646

TY - GEN

T1 - Quantitative characterization of aberrations in x-ray optics

AU - Seiboth, Frank

AU - Kahnt, Maik

AU - Scholz, Maria

AU - Seyrich, Martin

AU - Wittwer, Felix

AU - Garrevoet, Jan

AU - Falkenberg, Gerald

AU - Schropp, Andreas

AU - Schroer, Christian G.

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

AB - Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

KW - aberrations

KW - Beam characterization

KW - compound refractive X-ray lenses

KW - hard X-ray nanobeam

KW - ptychography

KW - Zernike polynomials

U2 - 10.1117/12.2237646

DO - 10.1117/12.2237646

M3 - Paper in conference proceeding

AN - SCOPUS:85010756904

VL - 9963

BT - Advances in X-Ray/EUV Optics and Components XI

A2 - Morawe, Christian

A2 - Khounsary, Ali M.

A2 - Goto, Shunji

PB - SPIE

T2 - Conferene on Advances in X-Ray/EUV Optics and Components XI

Y2 - 31 August 2016 through 1 September 2016

ER -

Quantitative characterization of aberrations in x-ray optics

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Keywords

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