Quantitative characterization of aberrations in x-ray optics

Frank Seiboth, Maik Kahnt, Maria Scholz, Martin Seyrich, Felix Wittwer, Jan Garrevoet, Gerald Falkenberg, Andreas Schropp, Christian G. Schroer

Research output: Chapter in Book/Report/Conference proceedingPaper in conference proceedingpeer-review

Abstract

Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components XI
EditorsChristian Morawe, Ali M. Khounsary, Shunji Goto
PublisherSPIE
Volume9963
ISBN (Electronic)9781510603172
DOIs
Publication statusPublished - 2016 Jan 1
Externally publishedYes
EventConferene on Advances in X-Ray/EUV Optics and Components XI - San Diego, United States
Duration: 2016 Aug 312016 Sept 1

Conference

ConferenceConferene on Advances in X-Ray/EUV Optics and Components XI
Country/TerritoryUnited States
CitySan Diego
Period2016/08/312016/09/01

Free keywords

  • aberrations
  • Beam characterization
  • compound refractive X-ray lenses
  • hard X-ray nanobeam
  • ptychography
  • Zernike polynomials

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