Scanning probe lithography for nanoimprinting mould fabrication

Gang Luo, GY Xie, YY Zhang, GM Zhang, YY Zhang, Patrick Carlberg, T Zhu, ZF Liu

Research output: Contribution to journalArticlepeer-review

Abstract

We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds.
Original languageEnglish
Pages (from-to)3018-3022
JournalNanotechnology
Volume17
Issue number12
DOIs
Publication statusPublished - 2006

Subject classification (UKÄ)

  • Nano Technology

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