Site-control of InAs quantum dots on a patterned InP surface: As/P exchange reactions

Magnus Borgström, Tomas Bryllert, T. Sass, Lars-Erik Wernersson, Lars Samuelson, Werner Seifert

Research output: Chapter in Book/Report/Conference proceedingPaper in conference proceedingpeer-review

Abstract

We present the effect of annealing temperature and annealing time on InAs/InP site-controlled quantum dot growth. Electron beam pre-patterning forms carbon nano-deposits at the InP surface, which then can be used as growth masks to form nano-holes at the surface. By only annealing of the patterned InP surface under an arsine ambient, As/P exchange reactions produce material sufficient for selective dot nucleation in the holes at the surface
Original languageEnglish
Title of host publication7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science
PublisherLund University
Number of pages2
Publication statusPublished - 2002
EventProceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21) - Malmö, Sweden
Duration: 2002 Jun 242002 Jun 28

Conference

ConferenceProceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
Country/TerritorySweden
CityMalmö
Period2002/06/242002/06/28

Subject classification (UKÄ)

  • Condensed Matter Physics
  • Electrical Engineering, Electronic Engineering, Information Engineering

Free keywords

  • selective dot nucleation
  • arsine ambient
  • InAs-InP
  • nanoholes
  • patterned InP surface
  • InAs quantum dots
  • As/P exchange reactions
  • annealing temperature
  • annealing time
  • InAs/InP site controlled quantum dot growth
  • electron beam prepatterning forms
  • carbon nanodeposits
  • growth masks
  • InP surface

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