Abstract
We present the effect of annealing temperature and annealing time on InAs/InP site-controlled quantum dot growth. Electron beam pre-patterning forms carbon nano-deposits at the InP surface, which then can be used as growth masks to form nano-holes at the surface. By only annealing of the patterned InP surface under an arsine ambient, As/P exchange reactions produce material sufficient for selective dot nucleation in the holes at the surface
Original language | English |
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Title of host publication | 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science |
Publisher | Lund University |
Number of pages | 2 |
Publication status | Published - 2002 |
Event | Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21) - Malmö, Sweden Duration: 2002 Jun 24 → 2002 Jun 28 |
Conference
Conference | Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21) |
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Country/Territory | Sweden |
City | Malmö |
Period | 2002/06/24 → 2002/06/28 |
Subject classification (UKÄ)
- Condensed Matter Physics
- Electrical Engineering, Electronic Engineering, Information Engineering
Free keywords
- selective dot nucleation
- arsine ambient
- InAs-InP
- nanoholes
- patterned InP surface
- InAs quantum dots
- As/P exchange reactions
- annealing temperature
- annealing time
- InAs/InP site controlled quantum dot growth
- electron beam prepatterning forms
- carbon nanodeposits
- growth masks
- InP surface