Structural and optical properties of low-temperature ZnO films grown by atomic layer deposition with diethylzinc and water precursors

Iwona Kowalik, E. Guziewicz, K. Kopalko, S. Yatsunenko, A. Wojcik-Glodowska, M. Godlewski, P. Dluzewski, E. Lusakowska, W. Paszkowicz

Research output: Contribution to journalArticlepeer-review

54 Citations (SciVal)

Abstract

We report on properties of low-temperature (LT) ZnO films grown by the atomic layer deposition method with diethylzinc (DEZn) precursor. It is shown that the ZnO thin film crystallographic orientation, quality of the surface, and optical properties depend on the main growth parameters like temperature, pulsing, and purging time and thus can be varied in controllable manner. All the presented results were obtained for ZnO layers grown at temperature between 90 and 200 degrees C. (C) 2008 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)1096-1101
JournalJournal of Crystal Growth
Volume311
Issue number4
DOIs
Publication statusPublished - 2009

Subject classification (UKÄ)

  • Physical Sciences
  • Natural Sciences

Keywords

  • Heterojunction semiconductor devices
  • II-VI materials
  • Semiconducting
  • Zinc compounds
  • Characterization
  • Atomic layer epitaxy
  • Solar cells

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