Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

Axl Eriksson; Anurag Kawde; Lukas Hrachowina; Sarah R. McKibbin; Qi Shi; Magnus T. Borgström; Thomas Wågberg; Tönu Pullerits; Jens Uhlig

doi:10.1021/acsomega.4c03039

Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

Axl Eriksson, Anurag Kawde, Lukas Hrachowina, Sarah R. McKibbin, Qi Shi, Magnus T. Borgström, Thomas Wågberg, Tönu Pullerits, Jens Uhlig

Umeå University

Research output: Contribution to journal › Article › peer-review

Abstract

Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm² higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.

Original language	English
Pages (from-to)	20623-20628
Number of pages	6
Journal	ACS Omega
Volume	9
Issue number	18
DOIs	https://doi.org/10.1021/acsomega.4c03039
Publication status	Published - 2024

Subject classification (UKÄ)

Condensed Matter Physics (including Material Physics, Nano Physics)
Atom and Molecular Physics and Optics
Nano-technology

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10.1021/acsomega.4c03039Licence: CC BY

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@article{626676b4a841434aaa165eaa85015b3c,

title = "Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis",

abstract = "Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65\% higher PEC performance and 2.3 mA/cm2 higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.",

author = "Axl Eriksson and Anurag Kawde and Lukas Hrachowina and McKibbin, \{Sarah R.\} and Qi Shi and Borgstr{\"o}m, \{Magnus T.\} and Thomas W{\aa}gberg and T{\"o}nu Pullerits and Jens Uhlig",

note = "Publisher Copyright: {\textcopyright} 2024 The Authors. Published by American Chemical Society.",

year = "2024",

doi = "10.1021/acsomega.4c03039",

language = "English",

volume = "9",

pages = "20623--20628",

journal = "ACS Omega",

issn = "2470-1343",

publisher = "The American Chemical Society (ACS)",

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TY - JOUR

T1 - Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

AU - Eriksson, Axl

AU - Kawde, Anurag

AU - Hrachowina, Lukas

AU - McKibbin, Sarah R.

AU - Shi, Qi

AU - Borgström, Magnus T.

AU - Wågberg, Thomas

AU - Pullerits, Tönu

AU - Uhlig, Jens

PY - 2024

Y1 - 2024

N2 - Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm2 higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.

AB - Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm2 higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.

UR - https://www.scopus.com/pages/publications/85191880373

U2 - 10.1021/acsomega.4c03039

DO - 10.1021/acsomega.4c03039

M3 - Article

C2 - 38737027

AN - SCOPUS:85191880373

SN - 2470-1343

VL - 9

SP - 20623

EP - 20628

JO - ACS Omega

JF - ACS Omega

IS - 18

ER -

Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

Abstract

Subject classification (UKÄ)

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