Versatile vacuum chamber for in situ surface X-ray scattering studies

Dina Carbone; Olivier Plantevin; Raul Gago; Cristian Mocuta; Oier Bikondoa; Alejandro Alija; Lucien Petit; Hamid Djazuli; Till Hartmut Metzger

doi:10.1107/S0909049508003944

Versatile vacuum chamber for in situ surface X-ray scattering studies

Dina Carbone, Olivier Plantevin, Raul Gago, Cristian Mocuta, Oier Bikondoa, Alejandro Alija, Lucien Petit, Hamid Djazuli, Till Hartmut Metzger

Research output: Contribution to journal › Article › peer-review

Abstract

A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.

Original language	English
Pages (from-to)	414-419
Number of pages	6
Journal	Journal of Synchrotron Radiation
Volume	15
Issue number	4
DOIs	https://doi.org/10.1107/S0909049508003944
Publication status	Published - 2008
Externally published	Yes

Free keywords

Grazing incidence
In situ X-ray scattering
Portable chamber
Surfaces

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10.1107/S0909049508003944

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title = "Versatile vacuum chamber for in situ surface X-ray scattering studies",

abstract = "A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.",

keywords = "Grazing incidence, In situ X-ray scattering, Portable chamber, Surfaces",

author = "Dina Carbone and Olivier Plantevin and Raul Gago and Cristian Mocuta and Oier Bikondoa and Alejandro Alija and Lucien Petit and Hamid Djazuli and Metzger, {Till Hartmut}",

year = "2008",

doi = "10.1107/S0909049508003944",

language = "English",

volume = "15",

pages = "414--419",

journal = "Journal of Synchrotron Radiation",

issn = "0909-0495",

publisher = "International Union of Crystallography",

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TY - JOUR

T1 - Versatile vacuum chamber for in situ surface X-ray scattering studies

AU - Carbone, Dina

AU - Plantevin, Olivier

AU - Gago, Raul

AU - Mocuta, Cristian

AU - Bikondoa, Oier

AU - Alija, Alejandro

AU - Petit, Lucien

AU - Djazuli, Hamid

AU - Metzger, Till Hartmut

PY - 2008

Y1 - 2008

N2 - A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.

AB - A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.

KW - Grazing incidence

KW - In situ X-ray scattering

KW - Portable chamber

KW - Surfaces

U2 - 10.1107/S0909049508003944

DO - 10.1107/S0909049508003944

M3 - Article

AN - SCOPUS:46149117321

SN - 0909-0495

VL - 15

SP - 414

EP - 419

JO - Journal of Synchrotron Radiation

JF - Journal of Synchrotron Radiation

IS - 4

ER -

Versatile vacuum chamber for in situ surface X-ray scattering studies

Abstract

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