Abstract
In this chapter we present a non-destructive method for characterizing buried interfaces with high depth resolution combining X-rays standing wave and photoemission electron spectroscopy. This method incorporates the power of the X-rays photoelectron spectroscopy, which is a surface sensitive technique in the nanometer and sub-nanometer regime, with the depth selectivity of X-ray standing wave. This method has been successfully applied to study solid/solid interfaces and, more recently, solid/gas and solid/liquid interfaces, as we demonstrate on several examples. In addition, we also describe a few examples of liquid/solid interface characterization by standing wave X-ray fluorescence relevant for catalysis, energy science and biomedical applications.
| Original language | English |
|---|---|
| Title of host publication | Encyclopedia of Solid-Liquid Interfaces |
| Publisher | Elsevier |
| Pages | V1-324-V1-335 |
| Volume | 1-3 |
| ISBN (Electronic) | 9780323856690 |
| DOIs | |
| Publication status | Published - 2023 |
Subject classification (UKÄ)
- Atom and Molecular Physics and Optics
Free keywords
- Ambient pressure X-ray photoelectron spectroscopy
- Near total reflection X-ray photoelectron spectroscopy
- Solid/liquid interface
- Solid/solid interface
- Standing wave X-ray photoelectron spectroscopy
- X-ray fluorescence
- X-ray photoemission