A new laser-plasma X-ray source for microscopy and lithography

Research output: ThesisDoctoral Thesis (compilation)

Abstract

A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.

The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers, makes this source suitable for table-top X-ray microscopy and lithography. The initial development of the condenser arrangement for a table-top water-window X-ray microscope is described.

Details

Authors
  • Lars Rymell
Organisations
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Atom and Molecular Physics and Optics

Keywords

  • X-ray microscopy, X-ray lithography, Atomic and molecular physics, multilayer mirror, Fysicumarkivet A:1997:Rymell, Atom- och molekylärfysik, X-ray source, Laser-produced plasma, liquid droplet, debris-free, water window
Original languageEnglish
QualificationDoctor
Awarding Institution
Supervisors/Assistant supervisor
  • [unknown], [unknown], Supervisor, External person
Award date1997 May 23
Print ISBNs91-628-2497-X
Publication statusPublished - 1997
Publication categoryResearch

Bibliographic note

Defence details Date: 1997-05-23 Time: 13:15 Place: Lecture hall B, Sölvegatan 14, Lund External reviewer(s) Name: Lebert, R. Title: Dr Affiliation: [unknown] ---