Interference in the angular distribution of photoelectrons in superimposed XUV and optical laser fields

Research output: Contribution to journalArticle

Abstract

The angular distribution of photoelectrons ejected during the ionization of Ne atoms by extreme ultraviolet (XUV) free-electron laser radiation in the presence of an intense near infrared (NIR) dressing field was investigated experimentally and theoretically. A highly nonlinear process with absorption and emission of more than ten NIR photons results in the formation of numerous sidebands. The amplitude of the sidebands varies strongly with the emission angle and the angular distribution pattern reveals clear signatures of interferences between the different angular momenta for the outgoing electron in the multi-photon process. As a specific feature, the central photoelectron line is characterized at the highest NIR fields by an angular distribution, which is peaked perpendicularly to both the XUV and NIR polarization directions. Experimental results are reproduced by a theoretical model based on the strong field approximation.

Details

Authors
  • S. Duesterer
  • Linnea Rading
  • Per Johnsson
  • A. Rouzee
  • A. Hundertmark
  • M. J. J. Vrakking
  • P. Radcliffe
  • M. Meyer
  • A. K. Kazansky
  • N. M. Kabachnik
Organisations
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Atom and Molecular Physics and Optics
Original languageEnglish
Article number164026
JournalJournal of Physics B: Atomic, Molecular and Optical Physics
Volume46
Issue number16
Publication statusPublished - 2013
Publication categoryResearch
Peer-reviewedYes

Related research output

Rading, L., 2016, Lund. 146 p.

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