Polymer stamps for nanoimprinting

Research output: Contribution to journalArticle

Abstract

Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.

Details

Authors
  • K Pfeiffer
  • M Fink
  • G Ahrens
  • G Gruetzner
  • F Reuther
  • J Seekamp
  • S Zankovych
  • CMS Torres
  • Ivan Maximov
  • Marc Beck
  • Mariusz Graczyk
  • Lars Montelius
  • H Schulz
  • HC Scheer
  • F Steingrueber
Organisations
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Condensed Matter Physics

Keywords

  • crosslinked polymers, nanoimprint lithography, stamp fabrication, e-beam resist
Original languageEnglish
Pages (from-to)393-398
JournalMicroelectronic Engineering
Volume61-2
Publication statusPublished - 2002
Publication categoryResearch
Peer-reviewedYes