Polymer stamps for nanoimprinting

Research output: Contribution to journalArticle

Standard

Polymer stamps for nanoimprinting. / Pfeiffer, K; Fink, M; Ahrens, G; Gruetzner, G; Reuther, F; Seekamp, J; Zankovych, S; Torres, CMS; Maximov, Ivan; Beck, Marc; Graczyk, Mariusz; Montelius, Lars; Schulz, H; Scheer, HC; Steingrueber, F.

In: Microelectronic Engineering, Vol. 61-2, 2002, p. 393-398.

Research output: Contribution to journalArticle

Harvard

Pfeiffer, K, Fink, M, Ahrens, G, Gruetzner, G, Reuther, F, Seekamp, J, Zankovych, S, Torres, CMS, Maximov, I, Beck, M, Graczyk, M, Montelius, L, Schulz, H, Scheer, HC & Steingrueber, F 2002, 'Polymer stamps for nanoimprinting', Microelectronic Engineering, vol. 61-2, pp. 393-398. https://doi.org/10.1016/S0167-9317(02)00577-4

APA

Pfeiffer, K., Fink, M., Ahrens, G., Gruetzner, G., Reuther, F., Seekamp, J., Zankovych, S., Torres, CMS., Maximov, I., Beck, M., Graczyk, M., Montelius, L., Schulz, H., Scheer, HC., & Steingrueber, F. (2002). Polymer stamps for nanoimprinting. Microelectronic Engineering, 61-2, 393-398. https://doi.org/10.1016/S0167-9317(02)00577-4

CBE

Pfeiffer K, Fink M, Ahrens G, Gruetzner G, Reuther F, Seekamp J, Zankovych S, Torres CMS, Maximov I, Beck M, Graczyk M, Montelius L, Schulz H, Scheer HC, Steingrueber F. 2002. Polymer stamps for nanoimprinting. Microelectronic Engineering. 61-2:393-398. https://doi.org/10.1016/S0167-9317(02)00577-4

MLA

Vancouver

Pfeiffer K, Fink M, Ahrens G, Gruetzner G, Reuther F, Seekamp J et al. Polymer stamps for nanoimprinting. Microelectronic Engineering. 2002;61-2:393-398. https://doi.org/10.1016/S0167-9317(02)00577-4

Author

Pfeiffer, K ; Fink, M ; Ahrens, G ; Gruetzner, G ; Reuther, F ; Seekamp, J ; Zankovych, S ; Torres, CMS ; Maximov, Ivan ; Beck, Marc ; Graczyk, Mariusz ; Montelius, Lars ; Schulz, H ; Scheer, HC ; Steingrueber, F. / Polymer stamps for nanoimprinting. In: Microelectronic Engineering. 2002 ; Vol. 61-2. pp. 393-398.

RIS

TY - JOUR

T1 - Polymer stamps for nanoimprinting

AU - Pfeiffer, K

AU - Fink, M

AU - Ahrens, G

AU - Gruetzner, G

AU - Reuther, F

AU - Seekamp, J

AU - Zankovych, S

AU - Torres, CMS

AU - Maximov, Ivan

AU - Beck, Marc

AU - Graczyk, Mariusz

AU - Montelius, Lars

AU - Schulz, H

AU - Scheer, HC

AU - Steingrueber, F

PY - 2002

Y1 - 2002

N2 - Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.

AB - Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.

KW - crosslinked polymers

KW - nanoimprint lithography

KW - stamp fabrication

KW - e-beam resist

U2 - 10.1016/S0167-9317(02)00577-4

DO - 10.1016/S0167-9317(02)00577-4

M3 - Article

VL - 61-2

SP - 393

EP - 398

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 1873-5568

ER -