Schottky barrier and contact resistance of InSb nanowire field-effect transistors

Research output: Contribution to journalArticle

Abstract

Understanding of the electrical contact properties of semiconductor nanowire (NW) field-effect transistors (FETs) plays a crucial role in the use of semiconducting NWs as building blocks for future nanoelectronic devices and in the study of fundamental physics problems. Here, we report on a study of the contact properties of Ti/Au, a widely used contact metal combination, when contacting individual InSb NWs via both two-probe and four-probe transport measurements. We show that a Schottky barrier of height is present at the metal-InSb NW interfaces and its effective height is gate-tunable. The contact resistance () in the InSb NWFETs is also analyzed by magnetotransport measurements at low temperatures. It is found that in the on-state exhibits a pronounced magnetic field-dependent feature, namely it is increased strongly with increasing magnetic field after an onset field . A qualitative picture that takes into account magnetic depopulation of subbands in the NWs is provided to explain the observation. Our results provide solid experimental evidence for the presence of a Schottky barrier at Ti/Au-InSb NW interfaces and can be used as a basis for design and fabrication of novel InSb NW-based nanoelectronic devices and quantum devices.

Details

Authors
Organisations
External organisations
  • Peking University
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Nano Technology
  • Condensed Matter Physics

Keywords

  • contact resistance, field-effect transistor, InSb, magnetotransport, Nanowire, Schottky barrier
Original languageEnglish
Article number275204
JournalNanotechnology
Volume27
Issue number27
Publication statusPublished - 2016 May 27
Publication categoryResearch
Peer-reviewedYes