Study of thin oxide films by electron, ion and synchrotron radiation beams

Research output: Contribution to journalArticle

Abstract

Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.

Details

Authors
  • V Sammelselg
  • E Rauhala
  • K Arstila
  • Alexei Zakharov
  • J Aarik
  • A Kikas
  • J Karlis
  • A Tarre
  • A Seppala
  • J Asari
  • Indrek Martinson
Organisations
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Physical Sciences

Keywords

  • oxide films, TOF-ERDA, RBS, scanning photoelectron microscopy, EPMA
Original languageEnglish
Pages (from-to)165-169
JournalMikrochimica Acta
Volume139
Issue number1-4
Publication statusPublished - 2002
Publication categoryResearch
Peer-reviewedYes