Study of thin oxide films by electron, ion and synchrotron radiation beams

Research output: Contribution to journalArticle


Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.


  • V Sammelselg
  • E Rauhala
  • K Arstila
  • Alexei Zakharov
  • J Aarik
  • A Kikas
  • J Karlis
  • A Tarre
  • A Seppala
  • J Asari
  • Indrek Martinson
Research areas and keywords

Subject classification (UKÄ) – MANDATORY

  • Physical Sciences


  • oxide films, TOF-ERDA, RBS, scanning photoelectron microscopy, EPMA
Original languageEnglish
Pages (from-to)165-169
JournalMikrochimica Acta
Issue number1-4
Publication statusPublished - 2002
Publication categoryResearch