Fabrication of high aspect ratio SU-8 micropillar arrays

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SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8 μm, AR = 11 and an improved temporal stability.


  • Letizia Amato
  • Stephan S. Keller
  • Arto Heiskanen
  • Maria Dimaki
  • Jenny Emnéus
  • Anja Boisen
  • Maria Tenje
Externa organisationer
  • Technical University of Denmark

Ämnesklassifikation (UKÄ) – OBLIGATORISK

  • Analytisk kemi
  • Medicinteknik


Sidor (från-till)483-487
TidskriftMicroelectronic Engineering
Utgåva nummerSpecial issue MNE 2011 - Part II
StatusPublished - 2012
Peer review utfördJa
Externt publiceradJa