Nanoimprint stamps with ultra-high resolution: Optimal fabrication techniques

Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskrift

Abstract

Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.

Detaljer

Författare
  • Mariusz Graczyk
  • Andrea Cattoni
  • Benedikt Rösner
  • Gediminas Seniutinas
  • Anette Löfstrand
  • Anders Kvennefors
  • Dominique Mailly
  • Christian David
  • Ivan Maximov
Enheter & grupper
Externa organisationer
  • Paul Scherrer Institute
  • University of Paris-Sud
Forskningsområden

Ämnesklassifikation (UKÄ) – OBLIGATORISK

  • Nanoteknik
  • Annan elektroteknik och elektronik

Nyckelord

Originalspråkengelska
Sidor (från-till)73-78
Antal sidor6
TidskriftMicroelectronic Engineering
Volym190
StatusPublished - 2018 apr 15
PublikationskategoriForskning
Peer review utfördJa