Polymer stamps for nanoimprinting

Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskrift

Abstract

Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.

Detaljer

Författare
  • K Pfeiffer
  • M Fink
  • G Ahrens
  • G Gruetzner
  • F Reuther
  • J Seekamp
  • S Zankovych
  • CMS Torres
  • Ivan Maximov
  • Marc Beck
  • Mariusz Graczyk
  • Lars Montelius
  • H Schulz
  • HC Scheer
  • F Steingrueber
Enheter & grupper
Forskningsområden

Ämnesklassifikation (UKÄ) – OBLIGATORISK

  • Den kondenserade materiens fysik

Nyckelord

Originalspråkengelska
Sidor (från-till)393-398
TidskriftMicroelectronic Engineering
Volym61-2
StatusPublished - 2002
PublikationskategoriForskning
Peer review utfördJa