Polymer stamps for nanoimprinting

Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskrift


title = "Polymer stamps for nanoimprinting",
abstract = "Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.",
keywords = "crosslinked polymers, nanoimprint lithography, stamp fabrication, e-beam resist",
author = "K Pfeiffer and M Fink and G Ahrens and G Gruetzner and F Reuther and J Seekamp and S Zankovych and CMS Torres and Ivan Maximov and Marc Beck and Mariusz Graczyk and Lars Montelius and H Schulz and HC Scheer and F Steingrueber",
year = "2002",
doi = "10.1016/S0167-9317(02)00577-4",
language = "English",
volume = "61-2",
pages = "393--398",
journal = "Microelectronic Engineering",
issn = "1873-5568",
publisher = "Elsevier",