UV exposure: A novel processing method to fabricate nanowire solar cells

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceeding

Abstract

We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.

Detaljer

Författare
Enheter & grupper
Externa organisationer
  • Sol Voltaics AB
Forskningsområden

Ämnesklassifikation (UKÄ) – OBLIGATORISK

  • Nanoteknik
  • Energiteknik

Nyckelord

Originalspråkengelska
Titel på värdpublikation2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019
FörlagInstitute of Electrical and Electronics Engineers Inc.
Sidor2646-2648
Antal sidor3
ISBN (elektroniskt)9781728104942
StatusPublished - 2019
PublikationskategoriForskning
Peer review utfördJa
Evenemang46th IEEE Photovoltaic Specialists Conference, PVSC 2019 - Chicago, USA
Varaktighet: 2019 jun 162019 jun 21

Publikationsserier

NamnConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (tryckt)0160-8371

Konferens

Konferens46th IEEE Photovoltaic Specialists Conference, PVSC 2019
LandUSA
OrtChicago
Period2019/06/162019/06/21