Kurslaboratoriet för fysik LTH

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2002
Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
Maximov, I., Zakharov, AA., Holmqvist, T., Montelius, L. & Lindau, I., 2002, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. American Institute of Physics (AIP), Vol. 20. s. 1139-1142
Forskningsoutput: Kapitel i bok/rapport/Conference proceeding › Konferenspaper i proceeding › Peer review

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