Elke Theander

Sökresultat

• 2005

  An alignment procedure for nanoimprint lithography at the sub-20 nm level

  Adolph, D., Bolmsjö, E., Theander, E., Saers, R., Graczyk, M., Hessman, D., Maximov, I., Andersson-Engels, S., Persson, A., Wahlström, C-G., Beck, M., Carlberg, P., Heidari, B. & Montelius, L., 2005, Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005).

  Forskningsoutput: Kapitel i bok/rapport/Conference proceeding › Konferenspaper i proceeding
• 2004

  Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

  Keil, M., Beck, M., Frennesson, G., Theander, E., Bolmsjö, E., Montelius, L. & Heidari, B., 2004, J Vac Sci Technol B 22, 3283-3287 (2004).

  Forskningsoutput: Kapitel i bok/rapport/Conference proceeding › Konferenspaper i proceeding › Peer review

  17 Citeringar (SciVal)