Research interests: technology of semiconductor nanostructures, including electron beam (EBL) and nanoimprint lithography (NIL), block copolymer (BCP) lithography, focused ion beams (FIB), low-energy reactive ion etching (RIE) techniques.
I work to develop nanoimprint infrastructure at LNL, which includes both methods and applications of nanoimprint in large-scale patterning for fabrication of III-V nanowires and other nano-devices.
I also work to develop novel, high-resolution methods of nano lithography based on block copolymers (BCP) to reach sub-10 nm features. One of possible applications of such lithography would be technology of ultra-small III-V nanowires.