TY - JOUR
T1 - A tryptophan-substituted cholic acid : expanding the family of labelled biomolecules
AU - Travaglini, Leana
AU - Gubitosi, Marta
AU - di Gregorio, Maria Chiara
AU - D'Annibale, Andrea
AU - Meijide, Francisco
AU - Giustini, Mauro
AU - Sennato, Simona
AU - Obiols-Rabasa, Marc
AU - Schillén, Karin
AU - Pavel, Nicolae Viorel
AU - Galantini, Luciano
PY - 2015
Y1 - 2015
N2 - The synthesis of a novel cholic acid derivative bearing in the C-3 position a residue of tryptophan linked through an amide bond is herein described. Acidic or basic conditions are needed for the solubilization of the derivative in water. In alkaline solutions the molecule shows a self-association similar to the one of its natural precursor leading to the formation of ellipsoidal micelles which does not involve significant Trp–Trp interactions. On the contrary, in acidic conditions strong interactions between the tryptophan moieties occur, leading to the formation of a gel at low temperature. These interactions are broken upon heating and small micelles similar to those observed at high pH are formed. In both cases, fluorescence spectra suggest a polar environment for the amino acid fluorophore not remarkably affected by the self-assembly.
AB - The synthesis of a novel cholic acid derivative bearing in the C-3 position a residue of tryptophan linked through an amide bond is herein described. Acidic or basic conditions are needed for the solubilization of the derivative in water. In alkaline solutions the molecule shows a self-association similar to the one of its natural precursor leading to the formation of ellipsoidal micelles which does not involve significant Trp–Trp interactions. On the contrary, in acidic conditions strong interactions between the tryptophan moieties occur, leading to the formation of a gel at low temperature. These interactions are broken upon heating and small micelles similar to those observed at high pH are formed. In both cases, fluorescence spectra suggest a polar environment for the amino acid fluorophore not remarkably affected by the self-assembly.
U2 - 10.1016/j.colsurfa.2015.03.033
DO - 10.1016/j.colsurfa.2015.03.033
M3 - Article
SN - 0927-7757
VL - 483
SP - 142
EP - 149
JO - Colloids and Surfaces A: Physicochemical and Engineering Aspects
JF - Colloids and Surfaces A: Physicochemical and Engineering Aspects
IS - Online 31 March 2015
ER -