Core-level shifts on the H2O exposed Ge(100)2×1 surface

Christer Larsson, Anders Flodström, Ulf Karlsson, Yi-xin Yang

    Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskriftPeer review

    Sammanfattning

    Core-level spectroscopy and valence-band photoelectron spectroscopy were used to study the Ge(100)2×1 surface dosed with 0.5–100 L H2O at 160 K. It is determined that H2O adsorbs molecularly at 160 K and forms ice. The H2O molecules dissociate into H and OH radicals on the Ge(100)2×1 surface when the sample is heated to 300 K. A simple adsorption model that accounts for the calculated H and OH coverages is proposed.
    Originalspråkengelska
    Sidor (från-till)2044-2048
    TidskriftJournal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
    Volym7
    Nummer3
    DOI
    StatusPublished - 1989

    Ämnesklassifikation (UKÄ)

    • Elektroteknik och elektronik

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